Aurora PECVD

Configurations

Aurora 40M
- Single side deposition configuration with one process chamber, wafers are loaded and unloaded from same side of system

Aurora 25M DSD
- Double side deposition configuration with one process chamber, wafers are loaded and unloaded from same side of system. In this configuration, wafers are automatically inverted on the opposite end of the system, and returned into the Process Chamber for backside processing


 

The Aurora PECVD® is a thin film deposition system, optimized for  the superior quality thin films required in the fabrication of high efficiency crystalline solar cells.  

By combining the advanced technology of its Process Chamber design and the innovative concept of multi-directional tray-less material handling, the Aurora PECVD® is the best choice for optimum performance and ease of operation. Capable of depositing deposition all traditional CVD films, such as SiNx, SiOx, SiON, a-Si, etc